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IPC 7
G03F-G03F00902

SECTION G – PHYSICS


G 03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY (reproduction of pictures or patterns by scanning and converting into electrical signals H04N) [4]


G 03 FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrography, sensitive layers or processes G03G)


Note

 In this subclass, the following terms or expressions are used with the meanings indicated:

 "photosensitive" means not only sensitive of electromagnetic radiation but also to corpuscular radiation;

 "photosensitive compositions" covers photosensitive substances, e.g. quinonediazides, and, if applicable, binders or additives;

 "photosensitive materials" covers the photosensitive compositions, e.g. photoresists, the bases carrying them and, if applicable, auxiliary layers.  [5]



1/

00Preparation of originals for the photomechanical production of textured or patterned surfaces (photomechanical processes in general G03F 7/00) [3]

1/

02.by photographic processes for production of originals simulating relief

1/

04.by montage processes

1/

06.from printing surfaces  [5]

1/

08.Originals having inorganic imaging layers, e.g. chrome masks (G03F 1/12 takes precedence)  [5]

1/

10.by exposing and washing out pigmented or coloured organic layers; by colouring macromolecular patterns  [5]

1/

12.by exposing silver-halide-containing photosensitive materials or diazo-type photosensitive materials  [5]

1/

14.Originals characterised by structural details, e.g. supports, cover layers, pellicle rings  [5]

1/

16.Originals having apertures, e.g. for corpuscular lithography  [5]


3/

00Colour separation; Correction of tonal value (photographic copying apparatus in general G03B)

3/

02.by retouching

3/

04.by photographic means

3/

06..by masking

3/

08.by photoelectric means

3/

10.Checking the colour or tonal value of separation negatives or positives


5/

00Screening processes; Screens therefor

5/

02.by projecting methods (cameras G03B)

5/

04..changing the screen effect

5/

06..changing the diaphragm effect

5/

08..using line screens

5/

10..using cross-line screens

5/

12..using other screens, e.g. granulated screen

5/

14.by contact methods

5/

16..using grey half-tone screens

5/

18..using colour half-tone screens

5/

20.using screens for gravure printing

5/

22.combining several screens; Elimination of moire

5/

24.by multiple exposure, e.g. combined processes for line photo and screen


7/

00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L 21/00, H05K) [3,5]

7/

004.Photosensitive materials (G03F 7/12, G03F 7/14 take precedence)  [5]

7/

008..Azides (G03F 7/075 takes precedence)  [5]

7/

012...Macromolecular azides; Macromolecular additives, e.g. binders  [5]

7/

016..Diazonium salts or compounds (G03F 7/075 takes precedence)  [5]

7/

021...Macromolecular diazonium compounds; Macromolecular additives, e.g. binders  [5]

7/

022..Quinonediazides (G03F 7/075 takes precedence)  [5]

7/

023...Macromolecular quinonediazides; Macromolecular additives, e.g. binders  [5]

7/

025..Non-macromolecular photopolymerisable compounds having carbon-to-carbon triple bonds, e.g. acetylenic compounds (G03F 7/075 takes precedence)  [5]

7/

027..Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds (G03F 7/075 takes precedence)  [5]

7/

028...with photosensitivity-increasing substances, e.g. photoinitiators  [5]

7/

029....Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur  [5]

7/

031....Organic compounds not covered by group G03F 7/029  [5]

7/

032...with binders  [5]

7/

033....the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers  [5]

7/

035....the binders being polyurethanes  [5]

7/

037....the binders being polyamides or polyimides  [5]

7/

038..Macromolecular compounds which are rendered insoluble or differentially wettable (G03F 7/075 takes precedence; macromolecular azides G03F 7/012; macromolecular diazonium compounds G03F 7/021)  [5]

7/

039..Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F 7/075 takes precedence; macromolecular quinonediazides G03F 7/023)  [5]

7/

04..Chromates (G03F 7/075 takes precedence)  [5]

7/

06..Silver salts (G03F 7/075 takes precedence)  [5]

7/

07...used for diffusion transfer  [5]

7/

075..Silicon-containing compounds  [5]

7/

085..Photosensitive compositions characterised by adhesion-promoting non-macromolecular additives (G03F 7/075 takes precedence)  [5]

7/

09..characterised by structural details, e.g. supports, auxiliary layers (supports for printing plates in general B41N)  [5]

7/

095...having more than one photosensitive layer (G03F 7/075 takes precedence)  [5]

7/

105...having substances, e.g. indicators, for forming visible images  [5]

7/

11...having cover layers or intermediate layers, e.g. subbing layers  [5]

7/

115...having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing  [5]

7/

12.Production of screen printing forms or similar printing forms, e.g. stencils

7/

14.Production of collotype printing forms

7/

16.Coating processes; Apparatus therefor (applying coatings to base materials in general B05; applying photosensitive compositions to the base for photographic purposes G03C 1/74)

7/

18..Coating curved surfaces

7/

20.Exposure; Apparatus therefor (photographic printing apparatus for making copies G03B 27/00)  [4]

7/

207..Means for focusing, e.g. automatically (combination of positioning and focusing G03F 9/02; systems for automatic generation of focusing signals in general G02B 7/28; means for automatic focusing of projection printing apparatus G03B 27/34)  [4]

7/

213..Exposing with the same light pattern different positions of the same surface at the same time (G03F 7/207 takes precedence)  [4]

7/

22..Exposing sequentially with the same light pattern different positions of the same surface (G03F 7/207 takes precedence)  [4]

7/

23...Automatic means therefor  [4]

7/

24..Curved surfaces

7/

26.Processing photosensitive materials; Apparatus therefor (G03F 7/12 to G03F 7/24 take precedence)  [3,5]

7/

28..for obtaining powder images (G03F 3/10 takes precedence)  [5]

7/

30..Imagewise removal using liquid means  [5]

7/

32...Liquid compositions therefor, e.g. developers  [5]

7/

34..Imagewise removal by selective transfer, e.g. peeling away  [5]

7/

36..Imagewise removal not covered by groups G03F 7/30 to G03F 7/34, e.g. using gas streams, using plasma  [5]

7/

38..Treatment before imagewise removal, e.g. prebaking  [5]

7/

40..Treatment after imagewise removal, e.g. baking  [5]

7/

42..Stripping or agents therefor  [5]


9/

00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically (G03F 7/22 takes precedence; preparation of photographic masks G03F 1/00; within photographic printing apparatus for making copies G03B 27/00) [4]

9/

02.combined with means for automatic focusing (automatic focusing in general G02B 7/09; systems for automatic generation of focusing signals G02B 7/28)  [4]


  
 

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