Latest Inventions Technologies of salvaging A METHOD TO TREAT CHEMICAL AMMUNITION
A
method to treat chemical ammunition
Unlike traditionally applied
methods in which high temperature processing is used for treating chemical
ammunition, in the newly-patented technology a gasified chemical ammunition is
subjected to reduction reaction in a reactor at a temperature of 500° C to
1,000° C in the presence of a calcium aluminate-based catalyst. When halogen,
sulfur-containing, ammonium and phosphorous compounds and hydrides have been
separated in the form of flue gases, liquids or solids, reactive gases produced
in the reactor are then combusted or used as a furnace gas.
In the second modification of the
method, liquid or solid ammunition located on or in a solid matrix if required
are subjected to a pyrolysis reaction in an inert gas medium at a temperature of
300° C to 1,000° C. Before passing a reduction process in the reactor, gases
produced in the pyrolysis reaction and ash dust are selectively treated with an
organic solvent and then delivered to evaporation unit.
In the third modification of the
method, liquid or suspended solid ammunition compounds are mixed with organic
solvent or additionally disturbed in it and boiled down before the reduction.
In the fourth modification of the
method, pyrolysis is carried out at a temperature of 400° C to 700° C;
nitrogen, carbon dioxide or rare gases are used as an inert gas.
In the fifth modification of the
method, aliphatic spirits containing no more than 4 atoms of carbon, or complex
ethers of acids containing 1 to 4 atoms of carbon, or ketones containing 3 to 5
atoms of carbon are used as an organic solvent.
In the sixth modification of the
method, reaction in the reactor passes at a temperature of 700° C to 800° C.
In the seventh modification of
the method, depending on the type of ammunition being processed, arsenic or
arsenic and ammonia chloride are separated from reaction gases and removed in a
solid state if arsenic-organic compounds or chlorine-nitrogen-arsenic-organic
compounds are treated, respectively.
Valter Katsung (DE)
Patent number: 2156631
Publishing date: November 15, 2000
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