Traditional device for high temperature processing of radioactive and toxic waste includes a fire-resistant housing with a passage widening from up to down, and top and bottom sides. The housing is connected by its bottom side with a tight chamber equipped with an unloading unit and inside-installed container to collect processed product. Traditional device also includes a unit for waste loading, a plasma generator with a unit to deliver gaseous oxidant, and a gas-discharging pipe.

In the newly-proposed device, the fire-resistant housing which has a passage widening from top to bottom consists of an upper housing section with a length of L₁, in which a passage with a cross-section of S₁ is made. The bottom side of the section is connected with the top side of the housing lower section (the length of the section is L₂) in which a passage with a cross-section of S₂ is made. A pipe to supply gaseous oxidant into the housing lower section passage is located on the upper section side. At the same time, the housing upper side is the upper side of the upper section; and the housing lower side is the lower side of the housing lower section. The waste loading unit comprises a mixing chamber, equipped with a pipe to inject compressed air and a discharge pipe, with a dosing device installed to control waste delivery and a dosing device provided to control fluxing additives to the said chamber. In the new design, plasma generator with the unit for injection of gaseous oxidant in it is placed on a flat cover of a plasma chamber equipped with an inlet duct attached to its side. The bottom of the plasma chamber is connected with the housing upper side; the discharge port made in the bottom of the plasma chamber is linked with the housing upper section passage; and the plasma chamber inlet pipe is connected with the outlet pipe of the mixing chamber. The airtight chamber is provided with a cooling jacket. A cooling unit designed as a tube-plate heat exchanger or a water nozzle is installed inside the said airtight chamber between the housing lower side and a collecting container. Gas discharge duct is located on the airtight chamber side, below the cooling unit installation level. The plasma generator, the plasma chamber and the upper and lower sections of the housing are coaxially connected with one another. The following correlation is established: 2.3L₁>L₂>1.7L₁ and 4S₁>S₂>3S₁.

In the second modification of the device, a cylindrically-shaped plasma chamber is equipped with a tangentially-installed inlet pipe.

Dmitriyev S.A., etc.

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